SU-8 Removal | Semiconductor Application | PVATePla America, Inc. | 800-527-5667
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MEMS SU8 Ashing  

Plasma Based Solutions:

  Semiconductor Wafers
Photoresist Ashing
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  Ultra Thin Wafers
Wafer Stress Relief
Chip Side Stress Relief
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Wafer Thinning
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  Solar Cells
Solar Cell Etching
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MEMS SU8 Ashing
  Flat Panel Displays
Pixel Activation
FP Photoresist Ashing
Bond Finger Cleaning
  Chip Packaging
Bond Pad Cleaning
Flip Chip Underfill
Encapsulation
  Wafer Metrology
Stress Imaging
Implant Dosage
  Failure Analysis
Decapsulation
 
   Industrial Medical

Efficient SU8 Ashing & Sacrificial Layer Removal

Courtesy of SNU, Korea Courtesy Of University of Texas at Dallas

SU-8 photoresist has many remarkable properties that are ideally suited for use in the fabrication of MEMS and microfluidic devices. SU-8 is a negative-imaging epoxy-type, near-UV photoresist that can be spun with uniform thickness up to 2 mm and its excellent transparency allows processing with standard mask aligners. Among the many merits of this photoresist for MEMS manufacture, is its chemical stability. Unfortunately SU-8 is so stable that its difficult to remove. PVA TePla has successfully developed a plasma process to remove SU-8 by plasma ashing.

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Related Products:
1
PS 300 The PS 300 series of microwave batch resist ashers ranges from manual to fully automated accommodating wafers from 2" to 8" (50 to 200 mm)
PS 300 Serie
b
c Fully automatic single wafer resist
stripping system for implant resist
and MEMS applications for wafers
up to 300 mm
PS 90
b
PS 4008
Plasma system with large area planar source technology for low temperature ashing of SU-8 and other sensitive organic layers. Used in MEMS-fabrication and OLED/PLED development. Holds one 300 mm wafer or four 150 mm wafers
PS 4008
c
M4L Laboratory or pilot scale bench top microwave system ideal for resist ashing, wafer cleaning and decapsulation of electronic devices
PS 210
a
PS 600 The PS600 is a RF type Batch Plasma asher for semiconductor frontend applications. It is the pendant to our Microwave Plasma System 300- but operates with 13.56 MHz.
PS 600
E

 

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